Circuit apparatus having a rounded trace

ABSTRACT

In various embodiments of the present invention a circuit apparatus having a rounded trace, a method to manufacture the circuit apparatus, and a design structure used in the design, testing, or manufacturing of the circuit apparatus are described. An artwork layer having an adaptable-mask section allows a graded amount of light to pass into an underlying photoresist layer. Subsequent to developing the photoresist layer, the graded amount of light creates a rounded geometric void used as a mold or sidewall for the creation of at least a portion of a rounded trace. The photoresist layer is removed resulting in a circuit apparatus having a rounded trace.

CROSS REFERENCE TO RELATED APPLICATIONS

The present application is related to U.S. Pat. No. 8,434,222, entitled “Method to Manufacture a Circuit Apparatus Having a Rounded Differential Pair Trace.”

BACKGROUND OF THE INVENTION

1. Field of the Invention

Embodiments of this invention relate generally to electronic systems and more specifically relate to a circuit apparatus having an electrically conductive trace, methods of manufacturing the circuit apparatus, and design structures used in the design, manufacturing, and/or test of the circuit apparatus.

2. Description of the Related Art

A printed circuit board (PCB), flex circuit, or the like are used to mechanically support and electrically connect electronic components using conductive pathways, or traces.

PCBs consist of various insulating dielectric layers that may be laminated together with epoxy or equivalent material. A variety of different dielectrics can be chosen to provide different insulating values depending on the requirements of the circuit. Some of these dielectrics are polytetrafluoroethylene, FR-4, FR-1, CEM-1, CEM-3, polyimide, etc. Well known epoxy materials used in the PCB industry are FR-2 (Phenolic cotton paper), FR-3 (Cotton paper and epoxy), FR-4 (Woven glass and epoxy), FR-5 (Woven glass and epoxy), FR-6 (Matte glass and polyester), G-10 (Woven glass and epoxy), CEM-1 (Cotton paper and epoxy), CEM-2 (Cotton paper and epoxy), CEM-3 (Woven glass and epoxy), CEM-4 (Woven glass and epoxy), CEM-5 (Woven glass and polyester).

Some PCB traces are made by bonding a layer of copper over the entire substrate, sometimes on both sides of the substrate, then removing unwanted copper after applying a temporary mask (e.g. by etching), leaving only the desired copper traces. Other PCB traces are made by adding traces to the bare substrate or a substrate with a very thin layer of copper usually by a process of multiple electroplating steps.

SUMMARY OF THE INVENTION

In various embodiments of the present invention a circuit apparatus having a rounded trace, a method to manufacture the circuit apparatus, and a design structure used in the design, testing, or manufacturing of the circuit apparatus are described.

In an embodiment of the present invention a method for manufacturing the circuit apparatus includes applying a first photoresist layer to a substrate; registering a first artwork layer having at least one adaptable-mask section and at least one continuous-mask section upon the first photoresist layer; and developing the first photoresist layer.

In other embodiments of the present invention the method of manufacturing further includes applying a second photoresist layer upon the developed first photoresist layer; registering a second artwork layer having at least one adaptable-mask section and at least one continuous-mask section layer upon the second photoresist layer; developing the second photoresist layer; applying an electroplating seed layer within a void created in the developed first photoresist layer and developed second photoresist layer; creating a trace within the void; and/or removing the first photoresist layer and the second photoresist layer.

In other embodiments of the present invention the method of manufacturing further includes applying an electroplating seed layer within a void created in the developed first photoresist layer; creating a first trace portion within the void created in the developed first photoresist layer; applying a second photoresist layer upon the first developed photoresist layer; registering a second artwork layer having at least one adaptable-mask section and at least one continuous-mask section layer upon the second photoresist layer; developing the second photoresist layer; applying an electroplating seed layer within a void created in the developed second photoresist layer; creating a second trace portion within the void created in the developed second photoresist layer; and/or removing the first photoresist layer and the second photoresist layer.

In another embodiment of the present invention the circuit apparatus include a first photoresist layer upon a substrate and a first artwork layer having at least a first adaptable-mask section and at least a first continuous-mask section upon the first photoresist layer.

In other embodiments of the present invention the first adaptable-mask section has one or more attenuated sections allowing for a graded amount of light to pass through the first adaptable-mask section, where the light passing through the first adaptable-mask section penetrates the first photoresist layer a graded depth and/or where the first continuous-mask section allows a similar amount of light to pass through the first continuous-mask section.

In another embodiment of the present invention the circuit apparatus further includes a second photoresist layer and a second artwork layer having at least a second adaptable-mask section and at least a second continuous-mask section upon the second photoresist layer.

In other embodiments the second photoresist layer has one or more oppositely attenuated sections relative to the first photoresist layer; the first continuous-mask section is either sufficiently transparent allowing for complete light transmission or is sufficiently opaque allowing for no light transmission; and/or the second continuous-mask section allows for the opposite light transmission relative to the first continuous-mask section.

In another embodiment a design structure embodied in a machine readable medium for designing, manufacturing, or testing an circuit apparatus, includes a functional representation of one or more of those features of the circuit apparatus described above.

These and other features, aspects, and advantages will become better understood with reference to the following description, appended claims, and accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

So that the manner in which the above recited features of the present invention are attained and can be understood in detail, a more particular description of the invention, briefly summarized above, may be had by reference to the embodiments thereof which are illustrated in the appended drawings.

It is to be noted, however, that the appended drawings illustrate only typical embodiments of this invention and are therefore not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.

FIGS. 1-6 depict a circuit apparatus during manufacturing stages according to embodiments of the present invention.

FIGS. 7-8 depict a circuit apparatus during circular trace creation stages according to embodiments of the present invention.

FIG. 9 depicts a circuit apparatus having circular traces according to an embodiment of the present invention.

FIGS. 10-15 depict a circuit apparatus during alternative manufacturing stages according to embodiments of the present invention.

FIG. 16 depicts a circuit apparatus having circular traces thereupon according to an embodiment of the present invention.

FIG. 17 depicts an exploded view of a circuit apparatus having circular traces thereupon according to an embodiment of the present invention.

FIGS. 18 and 19 depict attenuated artwork allowing for ultra violet light to penetrate photoresist layers at varying depths according to embodiments of the present invention.

FIGS. 20-21 depict methods to manufacture a circuit apparatus having circular traces thereupon according to an embodiment of the present invention.

FIG. 22 depicts a flow diagram of a design process used in circuit apparatus design, manufacturing, and/or test according to an embodiment of the present invention.

DETAILED DESCRIPTION

For a better understanding of the various embodiments of the present invention, together with other and further features and advantages thereof, reference is made to the following description, taken in conjunction with the accompanying drawings, and the scope of the invention asserted in the claims.

It will be readily understood that the components of the present invention, as generally described and illustrated in the Figures herein, may be arranged and predetermined in a wide variety of different configurations. Thus, the following more detailed description of the embodiments of the circuits, design structure, and methods of the present invention, as represented in FIGS. 1-22, are not intended to limit the scope of the invention, as claimed, but is merely representative of selected exemplary embodiments of the invention.

As will be appreciated by one skilled in the art, various embodiments of the present invention may be embodied as a system, apparatus, method, design structure, computer program product or a combination thereof. Accordingly, embodiments of the present invention may take the form of an entirely hardware embodiment, an entirely software embodiment (including firmware, resident software, micro-code, etc.), or an embodiment combining software and hardware aspects that may all generally be referred to, for example as a “circuit,” “module” or “system.” Furthermore, embodiments of the present invention may take the form of a computer program product embodied in any tangible medium of expression having computer usable program code embodied in the medium.

Reference throughout this specification to “one embodiment” or “an embodiment” (or the like) means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the present invention. Thus, appearances of the phrases “in one embodiment” or “in an embodiment” in various places throughout this specification are not necessarily all referring to the same embodiment. In addition, features described in connection with a particular embodiment may be combined or excluded from other embodiments described herein.

Embodiments of the present invention are described below with reference to flowchart illustrations and/or block diagrams of methods, apparatus, design structures, and computer program products according to embodiments of the invention. It will be understood that each block of the flowchart illustrations and/or block diagrams, and combinations of blocks in the flowchart illustrations and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create means for implementing the functions/acts specified in the flowchart and/or block diagram block or blocks.

These computer program instructions may also be stored in a computer-readable medium that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable medium produce an article of manufacture including instruction means which implement the function/act specified in the flowchart and/or block diagram block or blocks.

Any combination of one or more computer usable or computer readable medium(s) may be utilized. The computer-usable or computer-readable medium may be, for example but not limited to, an electronic, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus, device, or propagation medium. More specific examples (a non-exhaustive list) of the computer-readable medium would include the following: an electrical connection having one or more wires, a portable computer diskette, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or Flash memory), an optical fiber, a portable compact disc read-only memory (CDROM), an optical storage device, a transmission media such as those supporting the Internet or an intranet, a magnetic or other such storage device, or a design process system utilized in the design, manufacturing, and or testing of an electronic component or system.

In some alternative implementations, the functions noted in the block may occur out of the order noted in the figures. For example, two blocks shown in succession may, in fact, be executed concurrently, or the blocks may sometimes be executed in the reverse order, depending upon the functionality involved.

Design structures used in the design, manufacturing, or testing of a circuit apparatus having rounded traces described herein may be utilized to distribute a representation of the circuit apparatus to a computer system. The distribution may be on a distribution medium such as floppy disk or CD-ROM or may be over a network such as the Internet using FTP, HTTP, or other suitable protocols. From there, the representation of the circuit apparatus may be copied to a hard disk or a similar intermediate storage medium and later utilized in the design, manufacturing, or testing of such circuit apparatus.

FIG. 1 depicts a cross-section of a circuit apparatus during a photoresist application manufacturing stage according to an embodiment of the present invention. A photoresist layer 10 is applied upon, laminated, or otherwise joined to a substrate 12. In certain embodiments, photoresist layer 10 may be a temporary lawyer and may be temporarily joined to substrate 12 using various adhesives, epoxies, or the like (e.g. the photoresist may be applied as a dry film or liquid, etc.). Substrate 12 may be a flexible laminate or rigid laminate depending on the application of the desired circuit and may be made from various dielectric material(s), such as, polytetrafluoroethylene, FR-4, FR-1, CEM-1, CEM-3, polyimide, or the equivalent.

Photoresist layer 10 is sensitive to light, and in certain embodiments may be sensitive to ultraviolet light, deep ultra violet light, the H and I lines of a mercury-vapor lamp, etc. When exposed to light those exposed sections of photoresist layer 10 become soluble or insoluble depending upon whether photoresist layer 10 is a positive tone photoresist or a negative tone photoresist. The height of photoresist layer 10 is related to the desired height of the trace. More specifically, the height of photoresist layer 10 is half the height of the desired trace.

A positive tone photoresist is a type of photoresist in which the portion of the photoresist that is exposed to light becomes soluble to a photoresist developer. The portion of the positive tone photoresist that is unexposed remains insoluble to the photoresist stripper that may be later used to dissolve the exposed portion of the positive tone photoresist. A negative tone resist is a type of photoresist in which the portion of the photoresist that is exposed to light becomes relatively insoluble to the photoresist developer. Likewise, in a post process the unexposed portion of the negative tone photoresist may be dissolved by a photoresist developer.

A first example is herein recited describing various manufacturing stages where photoresist layer 10 is a positive tone photoresist, though in other applications photoresist layer 10 may be a negative tone photoresist. This first example is carried forward in subsequent manufacturing stages documented in this detailed description.

FIG. 2 depicts a cross-section of a circuit apparatus during an artwork registration manufacturing stage according to embodiments of the present invention. Artwork 14 is applied upon, registered, or otherwise joined to the Circuit apparatus of FIG. 1. Typically, artwork 14 is a glass master that is registered via fiducials and pinned in place directly over the photoresist layer. A vacuum is optionally drawn over the glass master/PR to eliminate air and ensure intimate contact. Artwork 14 has one or more adaptable-mask sections 16 and one or more continuous-mask sections 18. Adaptable-mask section 16 allows a graded, attenuated, decreasing, increasing, or otherwise user defined amount of light to pass through the adaptable-mask section 16 across the length of section 16. Continuous-mask section 18 allows a similar or otherwise constant amount of light to pass through the continuous-mask section 18 across the length of section 18. Typically continuous-mask section 18 allows either all light or no light to pass through the section 18.

The density of adaptable-mask section 16 is graded, attenuated, less or more dense, or is otherwise user defined across the length of section 16 to allow for a predetermined varying amount of light to pass through adaptable-mask section 16. Therefore, when light is exposed to the circuit apparatus of FIG. 2, a predetermined varying amount of light may penetrate photoresist layer 10 creating a soluble section and insoluble section in photoresist layer 10 beneath the adaptable-mask section 16. Adaptable-section 16 and the soluble and insoluble photoresist sections are further described with reference to FIG. 18 below.

Depending if photoresist layer 10 is a positive tone or a negative tone photoresist, continuous-mask section 18 allows either light to completely pass through (i.e. continuous-mask section 18 is transparent or nearly transparent, etc.) or does not allow light to pass through (i.e. continuous-mask section 18 is opaque or nearly opaque, etc.). For example if photoresist layer 10 is a positive tone photoresist, continuous-mask section 18 is sufficiently opaque and blocks light from passing through to photoresist layer 10. If photoresist 10 is a negative tone photoresist, continuous-section 18 is sufficiently transparent and allows light to pass through to photoresist layer 10.

In the first example adaptable-mask section 16 is sufficiently opaque at a first edge, gradually becomes more transparent becoming sufficiently transparent, and gradually becomes more and more opaque becoming sufficiently opaque at a second edge. Also in the first example, continuous-section 18 is sufficiently opaque. Consequently, no light penetrates the location of photoresist 10 beneath the first and second edges of adaptable-mask section 16 and beneath the continuous-section(s) 18. The largest amount of light penetrates the location of photoresist 10 beneath the sufficiently transparent location of adaptable-mask section 16.

FIG. 3 depicts a cross-section of a circuit apparatus during a photoresist develop manufacturing stage according to embodiments of the present invention. The circuit apparatus of FIG. 2 is exposed to light, allowing those sections of photoresist 10 beneath adaptable-section 16 being exposed to light or being otherwise developed, resulting in a soluble section and an insoluble section of photoresist layer 10. Subsequently the soluble section(s) may be removed by a photoresist developer. After removal of the soluble section(s), photoresist layer 10 becomes developed photoresist layer 20 and the circuit apparatus of FIG. 2 becomes the circuit apparatus of FIG. 3.

Upon removal of the soluble section(s), developed photoresist layer 20 has one or more resulting geometric voids 24 used later to develop at least a portion of a trace. Within each geometric void 24 there exists an area of exposed substrate 23. Exposed substrate 23 is a sufficiently large interface between the trace and the substrate 12 and exists so that the trace may be sufficiently bonded, or otherwise attached, to substrate 12. Please note that a sufficiently large interface may in fact be quite small, thus allowing for a small area of exposed substrate 23.

In the first example, the geometric voids 24 take the form of one or more concave wells 22. Concave wells 22 may be elliptical, circular, or an equivalent shape used to form a rounded, arced, concave, or otherwise curved trace sidewall. In the present first example concave well 22 is the shape of the lower half of an ellipse or circle. The top surface of developed photoresist 20 may be a bisecting line of the geometric shape of the concave wells 22. Depending upon the desired geometry of the trace, however, there may be one or more straight segments within the arced or curved side walls. In some embodiments, the bottom of the concave well 22 is coincident to substrate 12, where thus a small area of exposed substrate 23 exists at the bottom of rounded well 22. In other embodiments a larger area of exposed substrate 23 exists at the bottom of concave well 22.

FIG. 4 depicts a cross-section of a circuit apparatus during a photoresist application manufacturing stage according to an embodiment of the present invention. Another or otherwise second photoresist layer 25 is applied upon, laminated, or otherwise joined to the circuit apparatus of FIG. 3. Photoresist layer 25 is sensitive to light, and in certain embodiments may be sensitive to Ultra Violet (UV) light, Deep Ultra Violet (DUV) light, the H and I lines of a mercury-vapor lamp, etc. When exposed to light, or otherwise developed, those exposed sections of photoresist layer 25 become soluble or insoluble depending upon whether photoresist layer 25 is a positive tone photoresist or a negative tone photoresist. In certain embodiments photoresist layer 25 is a similar tone resist relative to photoresist layer 10. In other embodiments, photoresist layer 25 is an opposite tone resist relative to photoresist layer 10. In the first example photoresist layer 25 is an opposite tone resist relative to photoresist layer 10, or is in other words a negative tone photoresist. The height of the photoresist layer 25 is related to the desired height of the trace. More specifically, the height of the photoresist layer 25 is approximately half the height of the desired trace.

FIG. 5 depicts a cross-section of a circuit apparatus during an artwork registration manufacturing stage according to embodiments of the present invention. Artwork 26 is registered, applied upon, or otherwise joined to the circuit apparatus of FIG. 4. For example, artwork 26 is a glass master that is registered via fiducials and pinned in place directly over the photoresist layer 25. A vacuum is optionally drawn over the glass master/photoresist layer 25 to eliminate air and ensure intimate contact. Artwork 26 has one or more adaptable-mask sections 17 and one or more continuous-mask sections 19. Adaptable-mask section 17 allows a graded, attenuated, decreasing, increasing, or otherwise user defined amount of light to pass through the adaptable-mask section 17 across the length of section 17. Continuous-mask section 19 allows a similar or otherwise constant amount of light to pass through the continuous-mask section 19 across the length of section 19. Typically continuous-mask section 19 allows either all light or no light to pass through the section 19.

The density of adaptable-mask section 17 is graded, attenuated, less or more dense, or is otherwise user defined across the length of section 17 to allow for a predetermined varying amount of light to pass through adaptable-mask section 17. Therefore, when light is exposed to the circuit apparatus of FIG. 4, a predetermined varying amount of light may penetrate photoresist layer 25 creating a soluble section and insoluble section in photoresist layer 25 beneath the adaptable-mask section 17. Adaptable-section 17 and the soluble and insoluble photoresist sections are further described with reference to FIG. 19 below.

Depending if photoresist layer 25 is a positive tone or a negative tone photoresist, continuous-mask section 19 allows either light to completely pass through (i.e. continuous-mask section 19 is transparent or nearly transparent, etc.) or does not allow light to pass through (i.e. continuous-mask section 19 is opaque or nearly opaque, etc.). For example if photoresist layer 25 is a positive tone photoresist, continuous-mask section 19 is sufficiently opaque and blocks light from passing through to photoresist layer 25. If photoresist 25 is a negative tone photoresist, continuous-section 19 is sufficiently transparent and allows light to pass through to photoresist layer 25.

In the first example, adaptable-mask section 17 is sufficiently transparent at a first edge, gradually becomes more opaque becoming sufficiently opaque, and gradually becomes more and more transparent becoming sufficiently transparent at a second edge. Also in the first example, continuous-section 19 is sufficiently transparent. Consequently, no light penetrates the location(s) of photoresist 25 beneath the sufficiently opaque section of adaptable-mask section 17. A sufficient amount of light penetrates the location(s) of photoresist 25 beneath the sufficiently transparent location(s) of adaptable-mask section 17 and beneath the continuous-section(s) 19.

FIG. 6 depicts a cross-section of a circuit apparatus during a photoresist develop manufacturing stage according to embodiments of the present invention. The circuit apparatus of FIG. 5 is exposed to light, allowing those sections of photoresist 25 beneath adaptable-section 17 and continuous-section 18 being exposed to light or being otherwise developed, resulting in a soluble section and an insoluble section of photoresist layer 25. Subsequently the soluble section(s) may be removed by a photoresist developer. After removal of the soluble section(s), photoresist layer 25 becomes developed photoresist layer 32 and the circuit apparatus of FIG. 5 becomes the circuit apparatus of FIG. 6.

Upon removal of the soluble section(s), developed photoresist layer 32 has one or more resulting geometric voids 29 used later to develop at least a portion of a trace. Within each geometric void 29 there exists an opening 28. Opening 28 is a sufficiently large opening to allow access to, for example, geometric void 24 or exposed substrate 23 during later manufacturing steps (e.g. seeding, plating, etc.). Please note that opening 28 may in fact be quite small. Typically geometric void 29 meets, joins, or otherwise converges together with geometric void 24 to create a desired sidewall geometry used as a mold for trace creation.

In the first example, the geometric voids 29 take the form of one or more convex wells 34. Convex wells 34 may be elliptical, circular, or an equivalent shape used to form a rounded, arced, concave, or otherwise curved trace sidewall. In the present first example convex well 34 is the shape of the upper half of an ellipse or circle. Depending upon the desired geometry of the trace, however, there may be one or more straight segments within the arced or curved side walls. Convex wells 34 meet, join, or otherwise converge together with concave wells 22 to create an ellipse or circular geometry used as a mold for circular trace creation.

FIG. 7 depicts a cross-section of a circuit apparatus after a seed application stage according to embodiments of the present invention. An electroplating seed layer 36 is created on substrate 12 within, for example, geometric void 24. The electroplating seed layer 36 may comprise an adhesion layer and a plating-seed layer. The adhesion layer provides a more effective bonding surface for the plating-seed layer. The plating-seed layer may be for example photolithographically patterned within, and the length of, geometric void 24, generally defining the pattern of desired conductive traces. In other embodiments the seed layer 36 inherently possesses greater adhesion to laminate 12 and does not need to be photolithographically patterned into the geometric void 24. In other words seed layer 36 may naturally adhere only to laminate 12 and not to photoresist layers 20 and 32. The plating-seed layer may be a gold plating seed, hard gold plating seed, copper plating seed, palladium plating seed, etc. The plating-seed layer facilitates electroplating deposition of conductive traces on substrate 12 further described below.

FIG. 8 depicts a cross-section of a circuit apparatus during a plating stage according to embodiments of the present invention. For example, The circuit apparatus of FIG. 7 and the desired material used to create the trace (e.g. gold, hard gold, copper, etc.) are immersed in a electrolyte solution containing one or more dissolved metal salts as well as other ions that permit the flow of electricity. A rectifier supplies a direct current to the trace material, oxidizing the metal atoms that comprise it, allowing them to dissolve in the solution. The dissolved metal ions in the electrolyte solution are reduced at the interface between the solution and the seed layer 36, such that they plate onto the seed layer 36. A second plating stage may be used to create a gold-plated copper trace. Subsequent to plating the trace material fills the mold created by geometric voids 24 and 29 respectively. In the first example since the mold shape is rounded, rounded trace(s) 38 are created.

FIG. 9 depicts a circuit apparatus 35 having circular or rounded traces created after a removal manufacturing stage according to an embodiment of the present invention. After the electrically conductive traces have been formed in conformance with the mold or side walls of geometric voids 24 and 29 respectively, developed photoresist layers 20 and 32 are no longer required and may be stripped off using acetone or other known photoresist stripping solvents (e.g. aqueous alkaline solution, etc.). A circuit apparatus 35 is created having at least one electrically conductive rounded trace 38 supported by a substrate layer 12. The circuit apparatus 35 may take the form a PCB, a flex circuit, a chip package, silicon or other high speed interconnect, etc.

FIGS. 10-16 depict a circuit apparatus during alternative circular trace creation stages according to embodiments of the present invention. Instead of going through those manufacturing processes depicted in FIGS. 4-9, the circuit apparatus of FIG. 3 may go through the manufacturing processes of FIGS. 10-16 to create a circuit apparatus 35 having at least one rounded trace thereupon.

FIG. 10 depicts a cross-section of a circuit apparatus after a seed application stage according to embodiments of the present invention. An electroplating seed layer 36 is created on substrate 12 within, for example, geometric void 24. The plating-seed layer may be for example photolithographically patterned or adhered within, and the length of, geometric void 24, generally defining the pattern of desired conductive traces.

FIG. 11 depicts a cross-section of a circuit apparatus during a plating stage according to embodiments of the present invention. During the plating stage a portion 40 of plated electrically conductive metal (e.g. gold, hard gold, copper, gold-plated copper, etc.) fills geometric void 24. A post process polish may therefore be required to create a relatively flat surface across portion 40 and developed photoresist 20.

FIG. 12 depicts a cross-section of a circuit apparatus during a photoresist application stage and artwork registration stage according to embodiments of the present invention. Photoresist layer 25 is applied upon, laminated, or otherwise joined to the circuit apparatus of FIG. 11. Subsequently, artwork 26 is registered, applied upon, or otherwise joined to photoresist layer 25.

FIG. 13 depicts a cross-section of a circuit apparatus during a photoresist develop stage according to embodiments of the present invention. The circuit apparatus of FIG. 12 is exposed to light, allowing those sections of photoresist 25 beneath adaptable-section 17 and continuous-section 19 being exposed to light or being otherwise developed, resulting in the soluble section and the insoluble section of photoresist layer 25. Subsequently the soluble section(s) may be removed by the photoresist developer. After removal of the soluble section(s), photoresist layer 25 becomes developed photoresist layer 32 and the circuit apparatus of FIG. 12 becomes the circuit apparatus of FIG. 13.

FIG. 14 depicts a cross-section of a circuit apparatus after a seed application stage according to embodiments of the present invention. An electroplating seed layer 36 is created on portion 40 within, for example, geometric void 29. The plating-seed layer may be for example photolithographically patterned or adhered within, and the length of, geometric void 29, generally defining the pattern of desired conductive traces.

FIG. 15 depicts a cross-section of a circuit apparatus during a plating stage according to embodiments of the present invention. During the plating stage a portion 46 of plated electrically conductive metal (e.g. gold, hard gold, copper, gold-plated copper, etc.) fills geometric void 29. Portion 46 is created upon portion 40 and meets, joins, or otherwise converges together with portion 40 to create the desired trace geometry.

FIG. 16 depicts a circuit apparatus 35 having circular or rounded traces created after a removal manufacturing stage according to an embodiment of the present invention. After the electrically conductive traces have been formed in conformance with the mold or side walls of geometric voids 24 and 29 respectively, developed photoresist layers 20 and 32 are no longer required and may be stripped off using acetone, an aqueous alkaline solution, or other known photoresist stripping solvents. A circuit apparatus 35 is created having at least one electrically conductive rounded trace 42, having a portion 40 and portion 46, supported by a substrate layer 12. The circuit apparatus 35 may take the form a PCB, a flex circuit, a chip package, silicon or other high speed interconnect, etc.

FIG. 17 depicts an exploded cross-section view of the circuit apparatus 35 having either at least one rounded trace 38, or at least one rounded trace 42, according to an embodiment of the present invention. The rounded trace has a width (c), height (f), and length (i) (into the page). A lower portion of the rounded trace has a height (h) from substrate 12. An upper portion of the rounded trace has a height (g). In certain embodiments height (h) equals height (g). The lower portion has a radius (y) and a radius (z) and creates a circular or rounded lower portion of rounded trace 38 or 42 respectively. In some embodiments radius (y) equals radius (z). The upper portion has a radius (d) and a radius (w) and creates a circular or rounded upper portion of rounded trace 38 or 42 respectively. In some embodiments radius (d) equals radius (w).

A relatively flat surface on the lower portion of the rounded trace 38 or 42 has a width (e). Width (e) corresponds to the width of exposed substrate 23. The relatively flat surface allows for the lower portion of the rounded trace 38 or 42 to connect or otherwise adhere to substrate 12. Width (e) may be minimized to allow for a larger radius (z) or radius (y), and in some embodiments, width (e) may equal zero (i.e. there is little to no exposed substrate 23).

The upper portion of the rounded trace 38 or 42 has a relatively flat surface of width (x). Width (x) corresponds to the width of opening 28. Since the width of opening 28 is minimized, width (x) is also minimized. The flat surface of the upper portion may also have edges of height (b). Though the figure of width (x) and height (b) appear to be relatively large in FIG. 17, width (x) and height (b) may be small.

FIG. 18 depicts adaptable-mask section 16 that allow light 110 to penetrate a positive tone photoresist layer at varying depths according to embodiments of the present invention. The adaptable-mask section 16 is registered upon a photoresist layer. When exposed to light, the adaptable-mask section 16 allows for zero light transmission 106, attenuated light transmission 104, or complete light transmission 102. The portion of adaptable-mask section 16, corresponding to zero light transmission 106, is sufficiently opaque such that no light penetrates the underlying photoresist. The portion of adaptable-mask section 16, corresponding to complete light transmission 102, is sufficiently transparent such that light penetrates the entire height of the underlying photoresist. The portion of adaptable-mask section 16, corresponding to attenuated light transmission 104, allows light to increasingly gradually penetrate the underlying photoresist moving away from complete light transmission 102. Therefore light penetrates the underlying photoresist at varying depths. For instance, light may penetrate the underlying photoresist at depth m or at depth n, or more generally at depths indicated by the dashed line.

A soluble section 112 results from the variable light penetration depth across the width of the underlying resist. An insoluble section 114 is created where the light has not penetrated or has penetrated less than the height of the underlying resist.

FIG. 19 depicts adaptable-mask section 17 that allow light 110 to penetrate a negative tone photoresist layer at varying depths according to embodiments of the present invention. The adaptable-mask section 17 is registered upon a negative tone photoresist layer. When exposed to light, the adaptable-mask section 17 allows for zero light transmission 106, attenuated light transmission 104, or complete light transmission 102. The portion of adaptable-mask section 17, corresponding to zero light transmission 106, is sufficiently opaque such that no light penetrates the underlying photoresist. The portion of adaptable-mask section 17, corresponding to complete light transmission 102, is sufficiently transparent such that light penetrates the entire height of the underlying photoresist. The portion of adaptable-mask section 17, corresponding to attenuated light transmission 104, allows light to increasingly gradually penetrate the underlying photoresist moving away from complete light transmission 102. Therefore light penetrates the underlying photoresist at varying depths. For instance, light may penetrate the underlying photoresist at depth m or at depth n, or more generally at depths indicated by the dashed line. A soluble section 112 and insoluble section 114 results from the variable light penetration depth across the width of the underlying resist.

FIG. 20 depicts a method 200 for manufacturing a circuit apparatus having circular traces thereupon according to an embodiment of the present invention. Method 200 starts at block 202. A first photoresist layer is applied, laminated, or otherwise joined to a substrate (block 204). A first artwork layer is registered upon the first photoresist layer (block 206). The first photoresist layer is developed (block 208). A second photoresist layer is applied upon, laminated, or otherwise joined to the developed first photoresist layer (block 210). A second artwork layer is registered upon the second photoresist layer (block 212). The second photoresist layer is developed (block 214). An electroplating seed layer is applied within the void created by the developed first photoresist layer and developed second photoresist layer (block 216). A trace is created within the void (block 218). The first photoresist layer and the second photoresist layer is stripped away (block 220). Method 200 ends at block 222.

FIG. 21 depicts a method 300 for manufacturing a circuit apparatus having circular traces thereupon according to an embodiment of the present invention. Method 300 starts at block 302. A first photoresist layer is applied upon, laminated, or otherwise joined to a substrate (block 304). A first artwork layer is registered upon the first photoresist layer (block 306). The first photoresist layer is developed (block 308). An electroplating seed layer is applied within the developed first photoresist layer volume (block 310). A first trace portion is created within the developed first photoresist layer volume (block 312). A second photoresist layer is applied upon, laminated, or otherwise joined to the developed photoresist layer (block 314). A second artwork layer is registered upon the second photoresist layer (block 316). The second photoresist layer is developed (block 318). Another electroplating seed layer is applied within the developed second photoresist layer volume (block 320). A second trace portion is created within the developed second photoresist layer volume (block 322). The first photoresist layer and the second photoresist layer are stripped away (block 324). Method 300 ends at block 326.

FIG. 22 shows a block diagram of an exemplary design flow 400 used for example, in circuit apparatus design, simulation, test, layout, and manufacture. Design flow 400 includes processes and mechanisms for processing design structures to generate logically or otherwise functionally equivalent representations of the embodiments of the invention shown in FIGS. 1-19. The design structures processed and/or generated by design flow 400 may be encoded on machine-readable transmission or storage media to include data and/or instructions that when executed or otherwise processed on a data processing system generate a logically, structurally, or otherwise functionally equivalent representation of hardware components, circuits, devices, or systems.

FIG. 22 illustrates multiple such design structures including an input design structure 420 that is preferably processed by a design process 410. Design structure 420 may be a logical simulation design structure generated and processed by design process 410 to produce a logically equivalent functional representation of a hardware device. Design structure 420 may also or alternatively comprise data and/or program instructions that when processed by design process 410, generate a functional representation of the physical structure of a hardware device. Whether representing functional and/or structural design features, design structure 420 may be generated using electronic computer-aided design (ECAD) such as implemented by a core developer/designer. When encoded on a machine-readable data transmission or storage medium, design structure 420 may be accessed and processed by one or more hardware and/or software modules within design process 410 to simulate or otherwise functionally represent an electronic component, circuit, electronic or logic module, apparatus, device, or system such as those shown in FIGS. 1-19. As such, design structure 420 may comprise files or other data structures including human and/or machine-readable source code, compiled structures, and computer-executable code structures that when processed by a design or simulation data processing system, functionally simulate or otherwise represent circuits or other levels of hardware logic design. Such data structures may include hardware-description language (HDL) design entities or other data structures conforming to and/or compatible with lower-level HDL design languages such as Verilog and VHDL, and/or higher level design languages such as C or C++.

Design process 410 preferably employs and incorporates hardware and/or software modules for synthesizing, translating, or otherwise processing a design/simulation functional equivalent of the components, circuits, devices, or logic structures shown in FIG. 1-19 to generate a netlist 480 which may contain design structures such as design structure 420. Netlist 480 may comprise, for example, compiled or otherwise processed data structures representing a list of wires, discrete components, logic gates, control circuits, I/O devices, models, etc. that describes the connections to other elements and circuits in an integrated circuit design. Netlist 480 may be synthesized using an iterative process in which netlist 480 is resynthesized one or more times depending on design specifications and parameters for the device. As with other design structure types described herein, netlist 480 may be recorded on a machine-readable data storage medium. The medium may be a non-volatile storage medium such as a magnetic or optical disk drive, a compact flash, or other flash memory. Additionally, or in the alternative, the medium may be a system or cache memory, buffer space, or electrically or optically conductive devices and materials on which data packets may be transmitted and intermediately stored via the Internet, or other networking suitable means.

Design process 410 may include hardware and software modules for processing a variety of input data structure types including netlist 480. Such data structure types may reside, for example, within library elements 430 and include a set of commonly used elements, circuits, and devices, including models, layouts, and symbolic representations, for a given manufacturing technology. The data structure types may further include design specifications 440, characterization data 450, verification data 460, design rules 470, and test data files 485 which may include input test patterns, output test results, and other testing information. Design process 410 may further include modules for performing standard circuit design processes such as timing analysis, verification, design rule checking, place and route operations, etc.

Design process 410 employs and incorporates well-known logic and physical design tools such as HDL compilers and simulation model build tools to process design structure 420 together with some or all of the depicted supporting data structures to generate a second design structure 490. Similar to design structure 420, design structure 490 preferably comprises one or more files, data structures, or other computer-encoded data or instructions that reside on transmission or data storage media and that when processed by an ECAD system generate a logically or otherwise functionally equivalent form of one or more of the embodiments of the invention shown in FIGS. 1-19. In one embodiment, design structure 490 may comprise a compiled, executable HDL simulation model that functionally simulates the devices shown in FIG. 1-19.

Design structure 490 may also employ a data format used for the exchange of layout data of integrated circuits and/or symbolic data format. Design structure 490 may comprise information such as, for example, symbolic data, map files, test data files, design content files, manufacturing data, layout parameters, wires, levels of metal, vias, shapes, data for routing through the manufacturing line, and any other data processed by semiconductor manufacturing tools to fabricate embodiments of the invention as shown in FIGS. 1-19. Design structure 490 may then proceed to a stage 495 where, for example, design structure 490: proceeds to tape-out, is released to manufacturing, is released to a mask house, is sent to another design house, is sent back to the customer, etc.

It is to be understood that the present invention, in accordance with at least one present embodiment, includes a PCB, a flex circuit, a chip package, a silicon or other high speed interconnect, etc. that may be implemented in at least one electronic enclosure, such as general-purpose server running suitable software programs.

Although illustrative embodiments of the present invention have been described herein with reference to the accompanying drawings, it is to be understood that the invention is not limited to those precise embodiments, and that various other changes and modifications may be affected therein by one skilled in the art without departing from the scope or spirit of the invention. 

The invention claimed is:
 1. A circuit apparatus comprising: a photoresist layer applied directly upon a substrate; and an artwork layer directly placed upon the photoresist layer, the artwork layer having at least an adaptable-mask section that allows a graded amount of light to pass therethrough adjacent to and coplanar with at least a continuous-mask section.
 2. The circuit apparatus of claim 1, wherein the adaptable-mask section has one or more attenuated sections.
 3. The circuit apparatus of claim 1, wherein the continuous-mask section allows a similar amount of light to pass therethrough.
 4. The circuit apparatus of claim 1 wherein, light passing through first adaptable-mask section penetrates the photoresist layer at a graded depth.
 5. A circuit apparatus comprising: a first photoresist layer applied directly upon a substrate; a second photoresist layer applied directly upon the first photoresist layer; and an artwork layer directly placed upon the second photoresist layer, the artwork layer having at least an adaptable-mask section that allows a graded amount of light to pass therethrough adjacent to and coplanar with at least a continuous-mask section.
 6. The circuit apparatus of claim 5 wherein the second photoresist layer has one or more oppositely attenuated sections relative to one or more attenuated sections of the first photoresist layer.
 7. The circuit apparatus of claim 5, wherein, light passing through the adaptable-mask section penetrates the second photoresist layer at a graded depth. 